US20260158477A1 — 3D Metal, Metal Oxides, and Semiconductor Nanoscale Frameworks Through Templating of DNA-Programmable Lattice Scaffolds

A patent listed in the source archive DNA-Silica dossier. Of the eight patents in the dossier, this one is closest to the subject matter of the silica nanolattice paper: it claims a 3D silicate lattice with a porous motif and an inorganic layer superposed over it, plus a method of forming a silicate layer on a 3D nucleic acid lattice.

Claim language as quoted in the source

A composite, comprising: a three-dimensional (3D) silicate lattice, the silicate lattice comprising a first porous motif, the first porous motif optionally being characterized as polyhedral, the first porous motif optionally defining a pore size of from about 5 to about 100 nm; and a first inorganic layer superposed over the silicate lattice, the first inorganic layer optionally coupled to the silicate lattice. A device, the device comprising a composite according to the present disclosure. A method, comprising: forming a silicate layer superposed on a 3D nucleic acid lattice, the nucleic acid lattice comprising a first porous motif, the first porous motif optionally being characterized as polyhedral, the first porous motif optionally defining a pore size of from about 5 to about 100 nm; and forming a first inorganic layer superposed over the silicate layer, the first inorganic layer optionally coupled to the silicate layer.

Notes

• The claimed pore size range is about 5 to about 100 nm.
• The claim covers a composite, a device comprising the composite, and a method of forming it.
• This is claim language, not a demonstrated result. A patent is not proof of effectiveness.
• The title extends beyond silica to "3D metal, metal oxides, and semiconductor nanoscale frameworks," indicating the templating approach is claimed for a broader class of materials than the silica nanolattice paper reports.